Solving the Task of the Data Preprocessing for Photomasks Manufacturing Using Electron-Beam Lithography
Andrey Vladimirovich KORSHUNOV,
Daria Igorevna RYZHOVA,
Dmitriy Aleksandrovich BULAKH,
Ekaterina Dmitrievna ZUBAREVA,
Ivan Dmitrievich SALAKHOV,
Ilya Igorevich SHVETS,
Daniil Aleksandrovich KLIMUSHKIN https://doi.org/10.15514/ISPRAS-2026-38(2)-12
Abstract
When solving the photomasks manufacturing problem using electron beam lithography, it is often insufficient to perform only the final layout check using standard EDA CAD tools. The specifics of the electronic beam control mechanisms and the physics of its interaction with matter require additional input layout control procedures to verify geometric characteristics associated with the specific application of electron beam lithography and to ensure pattern reproducibility. This paper presents the results of a software module development designed to verify layout data used as input for electron beam photomask fabrication. A list of layout requirements that must be met to solve this problem is also provided, along with examples of solutions for verifying layout compliance with these requirements.
Keywords
Supporting agencies: This work was supported by the Russian Science Foundation, project no. 25-71-40001.
About the Authors
Andrey Vladimirovich KORSHUNOV
International Science and Technology Center
Russian Federation
Russian Federation
Cand. Sci. (Tech.), Assistant Professor at the Institute of Integrated Electronics. Research interests: research and development of design methods for energy-efficient VLSI and SoCs.
Daria Igorevna RYZHOVA
International Science and Technology Center
Russian Federation
Russian Federation
Cand. Sci. (Tech.), Head of the Research laboratory «Advanced VLSI CAD», Assistant Professor at the Institute of Integrated Electronics. Research interests: automated design systems, logical and timing analysis of circuits, accelerated peak current analysis of CMOS circuits, integrated circuit characterization, physical synthesis of micro- and nanoelectronics.
Dmitriy Aleksandrovich BULAKH
International Science and Technology Center
Russian Federation
Russian Federation
Cand. Sci. (Tech.), Assistant Professor at the Institute of Integrated Electronics. Research interests: VLSI EDA data simulation, processing and visualization algorithms.
Ekaterina Dmitrievna ZUBAREVA
International Science and Technology Center
Russian Federation
Russian Federation
A 3rd-year student at the Institute of Integrated Electronics. Research interests: algorithms of data processing in VLSI CAD.
Ivan Dmitrievich SALAKHOV
International Science and Technology Center
Russian Federation
Russian Federation
A student at NIU MIET, the Institute of Integrated Electronics. Research interests: development and optimization of modeling and data processing algorithms in VLSI CAD.
Ilya Igorevich SHVETS
National Research University of Electronic Technology (MIET)
Russian Federation
Russian Federation
Student of the direction of electronics and nanoelectronics. Research interests: development and programming of VLSI CAD.
Daniil Aleksandrovich KLIMUSHKIN
National Research University of Electronic Technology (MIET)
Russian Federation
Russian Federation
Electronics engineer of the 2nd category at Institute of Microdevices and Control Systems. Research interests: algorithms for controlling and processing information in technological processes.
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Review
For citations:
KORSHUNOV A.V., RYZHOVA D.I., BULAKH D.A., ZUBAREVA E.D., SALAKHOV I.D., SHVETS I.I., KLIMUSHKIN D.A. Solving the Task of the Data Preprocessing for Photomasks Manufacturing Using Electron-Beam Lithography. Proceedings of the Institute for System Programming of the RAS (Proceedings of ISP RAS). 2026;38(2):183-194. (In Russ.) https://doi.org/10.15514/ISPRAS-2026-38(2)-12
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